US Patent # 7,279,686

 

 

Integrated Sub-Nanometer-Scale

Electron Beam Systems

 


 

 

 

 

 

 

 

 

 

 

 

 

Integrated Sub-Nanometer-Scale Electron Beam Systems

 

Many analytical devices such as electron microscopes are used to image the topography and surface properties of materials. These devices utilize a focused beam of electrons to illuminate a surface, and both the microscope and the imaged object must be in a vacuum.

This issued patent decribes a solid state sub-nanometer-scale electron beam emitter incorporating a nano-sandwich Einzel lens that can provide for focusing the electron beam down to the nanometer scale and below. It also operates at a scale small enough that the imaged object does not have to be in vacuum, thus opening the potential for non-destructive imaging of live cells.

 

 

 

 

 

 

 

 

 

 

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