US Patent # 7,279,686
Integrated Sub-Nanometer-Scale
Electron Beam Systems
Integrated Sub-Nanometer-Scale Electron Beam Systems
Many analytical devices such as electron microscopes are used to image the topography and surface properties of materials. These devices utilize a focused beam of electrons to illuminate a surface, and both the microscope and the imaged object must be in a vacuum.
This issued patent decribes a solid state sub-nanometer-scale electron beam emitter incorporating a nano-sandwich Einzel lens that can provide for focusing the electron beam down to the nanometer scale and below. It also operates at a scale small enough that the imaged object does not have to be in vacuum, thus opening the potential for non-destructive imaging of live cells.