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Point Source for Producing Electron Beams

 

 

Overview

 

This technology provides improvements in electron beam lithography and improved scanning electron beam microscopy.  Unlike conventional bulky, expensive, technically sophisticated, and hard-to-adjust magnetic lenses that are typically used in electron beam and ion beam optical systems, this technology uses a tapered superconducting channel lens to achieve a much smaller, simpler, and passive system.  The same principles work for other charged particles (such as protons) and their antiparticles and for particles having an intrinsic magnetic moment as well as for some of their ionic and atomic counterparts.

 

For attaining ultimate electron beam focus, with the ultimate aim of attaining atomic resolution, low voltage imaging of biomolecules , or for increasing effective source to target working distance, a secondary electrostatic micro-lens might be used in conjunction with the tapered supersonducting lens.

 

Markets

 

SEM manufacturers, Semiconductor equipment manufacturers

 

IP Status

 

Patent Application # US 2003/0127594 published July 10, 2003

 

Inventors

The inventors are available to assist in developing and furthering this technology.

 

Contact

For more information and licensing arrangements please contact Biomed Solutions, LLC